Reading for Wednesday, October 11

1. Robert H. Dennard, Fritz H. Gaensslen, Hwa-Nien Yu, V.Leo Rideout, Ernest Bassous, and Andre R. LeBlanc. Design of Ion-Implanted MOSFET's with Very Small Physical Dimensions. Journal of Solid-State Circuits, 9(5):256--268, October 1974.
   

Supplemental Reading

1. Bijan Davari, Robert H. Dennard, and Ghavam G. Shahidi. CMOS Scaling for High Performance and Low Power---The Next Ten Years. Proceedings of the IEEE, 83(4):595--606, April 1995. also handed out in class
2. Mark Bohr. MOS Transistors: Scaling and Performance Trends. Semiconductor International, pages 75--79, June 1995.
3. Mark Bohr. Interconnect Scaling -- The Real Limiter to High Performance ULSI. In International Electron Devices Meeting 1995 Technical Digest, pages 241--244. Electron Devices Society of IEEE, December 1995.